Details

Tantalum sputtering target




Key words:

Tantalum sputtering target

tantalum target


Product Description


Commodity: Tantalum sputtering target
Purity: ≥99.9%

 

Table.Ⅰ.Chemical composition:

 

Chemistry                                                               ppm

Description

Chief component

Impurities  maxmium

Ta

Nb

Fe

Si

Ni

W

Mo

Ti

O

C

H

N

Ta1

Remainder

300

40

30

20

40

40

20

150

40

15

20

Ta2

Remainder

800

100

100

50

200

200

50

200

100

15

100

TaNb3

Remainder

<35000

100

 100

50

200

200

50

200

100

15

100

TaNb20

Remainder

170000-

230000

100

100

50

200

200

50

200

100

15

100

Ta2.5W

Remainder

400

50

30

20

30000

60

20

150

50

15

60

Ta10W

Remainder

400

50

30

20

110000

60

20

150

50

15

60

 

For tantalum sputtering target, we focus on to offer our customers with high purities ranging from 3N5 to 5N, fine and uniform grain size, elimination of strong texture banding, and early target life size stability.
Our tantalum sputtering targets' metallic impurities and gaseous impurities have been measured by known authorities around the world.
Besides, we also offer program of recycling reclaimed scrap targets.
Tantalum target is used as barrier metal for copper wiring device.