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Address:No.5 Building, No.581 Heilong Jiang Road, Li Yu Industrial Park, Tian Yuan District, Zhuzhou, Hunan, P.R. China.
Describe
Tantalum sputtering target
Commodity: Tantalum sputtering target
Purity: ≥99.9%
Table.Ⅰ.Chemical composition:
Chemistry ppm |
||||||||||||
Description |
Chief component |
Impurities maxmium |
||||||||||
Ta |
Nb |
Fe |
Si |
Ni |
W |
Mo |
Ti |
O |
C |
H |
N |
|
Ta1 |
Remainder |
300 |
40 |
30 |
20 |
40 |
40 |
20 |
150 |
40 |
15 |
20 |
Ta2 |
Remainder |
800 |
100 |
100 |
50 |
200 |
200 |
50 |
200 |
100 |
15 |
100 |
TaNb3 |
Remainder |
<35000 |
100 |
100 |
50 |
200 |
200 |
50 |
200 |
100 |
15 |
100 |
TaNb20 |
Remainder |
170000- 230000 |
100 |
100 |
50 |
200 |
200 |
50 |
200 |
100 |
15 |
100 |
Ta2.5W |
Remainder |
400 |
50 |
30 |
20 |
30000 |
60 |
20 |
150 |
50 |
15 |
60 |
Ta10W |
Remainder |
400 |
50 |
30 |
20 |
110000 |
60 |
20 |
150 |
50 |
15 |
60 |
For tantalum sputtering target, we focus on to offer our customers with high purities ranging from 3N5 to 5N, fine and uniform grain size, elimination of strong texture banding, and early target life size stability.
Our tantalum sputtering targets' metallic impurities and gaseous impurities have been measured by known authorities around the world.
Besides, we also offer program of recycling reclaimed scrap targets.
Tantalum target is used as barrier metal for copper wiring device.

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